PRODUCT
- Home
- /
- Product
ECV PROFILER CVP21
WEP deliver superior solutions for temperature control, semiconductor analysis and bond process control.
Add to Inquiry
View InquiryIntroduction
The Wafer Profiler CVP21 is an essential tool for measuring doping profiles in semiconductor layers using Electrochemical Capacitance Voltage Profiling (ECV-Profiling, CV-Profiling), making it ideal for both semiconductor research and production.
CVP21 supports a comprehensive range of materials, including:- Group IV semiconductors: Silicon (Si), Germanium (Ge), and Silicon Carbide (SiC).
- III-V semiconductors: Gallium Arsenide (GaAs), Indium Phosphide (InP), Gallium Phosphide (GaP), and more.
- Ternary III-V alloys: Aluminum Gallium Arsenide (AlGaAs), Gallium Indium Phosphide (GaInP), Aluminum Indium Arsenide (AlInAs), etc.
- Quaternary III-V alloys: Aluminum Gallium Indium Phosphide (AlGaInP), and others.
- Nitrides: Gallium Nitride (GaN), Aluminum Gallium Nitride (AlGaN), Indium Gallium Nitride (InGaN), Aluminum Indium Nitride (AlInN).
- II-VI semiconductors: Zinc Oxide (ZnO), Cadmium Telluride (CdTe), and Mercury Cadmium Telluride (HgCdTe, MCT).
- This versatility makes the CVP21 a robust solution for profiling a wide array of semiconductor materials.
BACK TO LIST