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Electronic Microscope
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Equipment
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Evactron® Model E25 Plasma De-Contaminators™
The microprocessor-based Evactron® E25 simplifies plasma operation with factory-programmed settings stored in its internal memory, reducing the need for extensive operator training. The compact, tabletop controller features embedded software that regulates a leak valve and controls chamber pressure via a MicroPirani™ gauge. It also manages RF power and includes a built-in clock for timing downstream plasma cleaning and nitrogen purging cycles. Operational data and fault events are logged by the microprocessor. Users can adjust parameters using the Encoder Knob, with menu options displayed on the front panel. The Enable/Disable Button activates the system for plasma cleaning. Additionally, the RS232 interface allows communication of key parameters—such as RF power (forward and reflected), vacuum levels, and operational/fault logs—to a remote computer using the provided Graphical User Interface (GUI).
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Evactron® E50 Plasma De-Contaminators™
The Evactron® E50 De-Contaminators are compact yet high-performance plasma cleaners designed for Electron and Ion Beam instruments, including SEMs, TEMs, and FIBs. The E50 delivers powerful cleaning to enhance resolution and imaging while improving detector and probe sensitivity, which can be compromised by contamination. With its high-power cleaning capabilities, the Evactron® E50 ensures fast and effective cleaning across a wide range of pressures, resulting in high-quality, artifact-free images and increased efficiency in sample analysis.
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Ex-situ Lift Off System
Samples can be directly EXLO (extra-cavity removal and TEM sample preparation) from 6”~12” wafers, which is faster and more accurate than in-situ stripping to prepare samples for TEM analysis.
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